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Pattern Projection with a Sinusoidal Phase Grating

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Abstract

The aim of this work is to study the diffractive properties of a sinusoidal phase grating for incorporation as a pattern projection element in a multisource and multicamera phase-shifting profilometric system. Two challenges should be overcome for successful operation of such a system, which are connected to inherent limitations of the phase-shifting algorithm—requirements for a sinusoidal fringe profile and for equal background and contrast of fringes in the recorded patterns. As a first task, we analyze the frequency content of the projected fringes in the Fresnel diffraction zone for parallel and divergent light illumination at different grating parameters and wavelengths. As a second task, we evaluate the systematical errors due to higher harmonics and multiwavelength illumination. Finally, operation of the four-wavelength profilometric system is simulated, and the error of the profilometric measurement evaluated. The results of test measurements are also presented.

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Correspondence to Elena Stoykova.

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Open Access This article is distributed under the terms of the Creative Commons Attribution 2.0 International License (https://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Stoykova, E., Harizanova, J. & Sainov, V. Pattern Projection with a Sinusoidal Phase Grating. EURASIP J. Adv. Signal Process. 2009, 351626 (2008) doi:10.1155/2009/351626

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Keywords

  • High Harmonic
  • Light Illumination
  • Publisher Note
  • Pattern Projection
  • Fresnel Diffraction