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Pattern Projection with a Sinusoidal Phase Grating


The aim of this work is to study the diffractive properties of a sinusoidal phase grating for incorporation as a pattern projection element in a multisource and multicamera phase-shifting profilometric system. Two challenges should be overcome for successful operation of such a system, which are connected to inherent limitations of the phase-shifting algorithm—requirements for a sinusoidal fringe profile and for equal background and contrast of fringes in the recorded patterns. As a first task, we analyze the frequency content of the projected fringes in the Fresnel diffraction zone for parallel and divergent light illumination at different grating parameters and wavelengths. As a second task, we evaluate the systematical errors due to higher harmonics and multiwavelength illumination. Finally, operation of the four-wavelength profilometric system is simulated, and the error of the profilometric measurement evaluated. The results of test measurements are also presented.

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Correspondence to Elena Stoykova.

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Open Access This article is distributed under the terms of the Creative Commons Attribution 2.0 International License (, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Stoykova, E., Harizanova, J. & Sainov, V. Pattern Projection with a Sinusoidal Phase Grating. EURASIP J. Adv. Signal Process. 2009, 351626 (2008).

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  • High Harmonic
  • Light Illumination
  • Publisher Note
  • Pattern Projection
  • Fresnel Diffraction